S.B. DONAEV; B.E. UMIRZAKOV; B.D. DONAEV. COMPOSITION AND ELECTRONIC PROPERTIES OF FILM CoSiO BY ION IMPLANTATION . International Journal of Innovations in Engineering Research and Technology, Maharashatra, India, p. 1–5, 2021. Disponível em: https://repo.ijiert.org/index.php/ijiert/article/view/2169. Acesso em: 25 aug. 2025.